Total Solution Company Value Engineering
E-beam | Sputter | H100, H200 | |
---|---|---|---|
Principle | A method of evaporating the coating material and depositing it on the substrate |
Deposits the protruding target particles by bombarding the ions in the plasma with the target material. |
Ion-assisted control + sputtering deposition → Nanolattice Control Coatings |
Vapor Deposition | Vapor(Liquid) | Atomic | Atomic + Ionic |
Confomality | Good | Good | Excellent |
Adhesion to Substrate | Bad | Good | Excellent |
Precision | Good | Good | Excellent |
Hardness | Bad | Good | Excellent |
Thermal Stability | Bad | Good | Excellent |
Light Transmittance | Good | Good | Excellent |